Etching a substrate: processes – Nongaseous phase etching of substrate – Etching inorganic substrate
Reexamination Certificate
2006-04-04
2006-04-04
Norton, Nadine G. (Department: 1765)
Etching a substrate: processes
Nongaseous phase etching of substrate
Etching inorganic substrate
C216S095000, C216S096000, C216S097000, C216S098000, C029S846000, C029S847000, C029S851000
Reexamination Certificate
active
07022251
ABSTRACT:
Disclosed is a method for forming a conductor on a dielectric. The method commences with the deposition of a conductive thickfilm on the dielectric, followed by a “subsintering” of the conductive thickfilm. Either before or after the subsintering, the conductive thickfilm is patterned to define at least one conductor. After subsintering, the conductive thickfilm is etched to expose the conductor(s), and the conductor(s) are then fired. A brief chemical etch may be used after the final firing step if improved wire-bondability is required.
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Casey John F.
Dove Lewis R.
Drehle James R.
Johnson Rosemary O.
Liu Ling
Agilent Technologie,s Inc.
Chen Eric B.
Norton Nadine G.
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