Etching a substrate: processes – Forming or treating electrical conductor article
Patent
1994-09-26
1998-08-04
Powell, William
Etching a substrate: processes
Forming or treating electrical conductor article
216 16, 216 22, 336200, 361268, 361738, 361764, B44C 122, H01L 2100
Patent
active
057888540
ABSTRACT:
The fabrication of thin film inductors on a substrate, which may include thin film resistors, thin film capacitors, and semiconductor devices. In one embodiment an inductor is fabricated initially on a substrate and then integrated with other devices subsequently formed on the substrate. In this embodiment, process steps used to fabricate such other devices utilize temperatures sufficiently low to prevent damaging or destroying the characteristics of the inductor. In another embodiment the fabrication of an inductor is achieved through photoresist masking and plating techniques. In alternative embodiments, fabrication of an inductor is achieved by sputtering, photoresist processes and etching/ion-milling techniques. A combination of various individual process steps from various embodiments are suitable for use to fabricate the individual layers to achieve a structure of this invention. The inductor fabricated in accordance with this invention is connected to other passive or active components through metal interconnections in order to improve the frequency performance of the inductor. In certain embodiments, parasitic capacitance of the inductor is significantly reduced by fabricating inductor coils on dielectric bridges. In certain embodiments, a magnetic core of ferromagnetic material is used to improve the performance of the inductor at frequencies below about 100 MHz.
REFERENCES:
patent: 2706697 (1955-04-01), Eisler
patent: 4297647 (1981-10-01), Akiyama
patent: 4496435 (1985-01-01), Harada et al.
patent: 4926292 (1990-05-01), Maple
patent: 5071509 (1991-12-01), Kano et al.
patent: 5227012 (1993-07-01), Brandli
patent: 5231078 (1993-07-01), Riebman et al.
patent: 5603847 (1997-02-01), Howard et al.
Electromagnetics for Engineers, Steven E. Schwarz, Saunders College Publishing, pp. 60-64, 1990.
Desaigoudar Chan M.
Gupta Suren
California Micro Devices Corporation
Caserza Steven F.
Powell William
LandOfFree
Methods for fabrication of thin film inductors, inductor network does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Methods for fabrication of thin film inductors, inductor network, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Methods for fabrication of thin film inductors, inductor network will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1173538