Optical: systems and elements – Methods
Reexamination Certificate
2006-08-18
2010-02-09
Dinh, Jack (Department: 2873)
Optical: systems and elements
Methods
C438S737000, C438S738000, C216S052000
Reexamination Certificate
active
07660058
ABSTRACT:
Certain MEMS devices include layers patterned to have tapered edges. One method for forming layers having tapered edges includes the use of an etch leading layer. Another method for forming layers having tapered edges includes the deposition of a layer in which the upper portion is etchable at a faster rate than the lower portion. Another method for forming layers having tapered edges includes the use of multiple iterative etches. Another method for forming layers having tapered edges includes the use of a liftoff mask layer having an aperture including a negative angle, such that a layer can be deposited over the liftoff mask layer and the mask layer removed, leaving a structure having tapered edges.
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Qiu Chengbin
Sasagawa Teruo
Tung Ming-Hau
Wang Chun-Ming
Zee Stephen
Dinh Jack
Knobbe Martens Olson & Bear LLP
QUALCOMM MEMS Technologies Inc.
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