Methods for determining feature-size accuracy of circuit pattern

Details Methods for determining feature-size accuracy of circuit pattern Methods for determining feature-size accuracy of circuit pattern

1974-11-19

1976-12-21

Kimlin, Edward C.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

96 27R, G03C 500

Patent

active

039986390

ABSTRACT:
In IC fabrication, feature size accuracy is monitored by making a test pattern composed of grating lines in proximity to two reference patterns. With the proper feature size, the test pattern will visually appear to have a shade of grey intermediate that of the two reference patterns. Too small a feature size will make the test pattern lighter, while too large a feature size will make it appear darker.

REFERENCES:
patent: 3393618 (1968-07-01), Baker
patent: 3506442 (1970-04-01), Kerwin
patent: 3555172 (1971-01-01), Heinz
patent: 3607267 (1971-09-01), Garrels
patent: 3690881 (1972-09-01), King
patent: 3719487 (1973-03-01), Schutze et al.
patent: 3746540 (1973-07-01), Rarey

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