Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate
2007-06-05
2007-06-05
Masinick, Michael D. (Department: 2125)
Data processing: generic control systems or specific application
Specific application, apparatus or process
Product assembly or manufacturing
C716S030000, C716S030000, C716S030000, C716S030000, C700S110000
Reexamination Certificate
active
11204143
ABSTRACT:
Semiconductor devices formed on wafers are inspected using a master wafer. A subject wafer of a semiconductor design is provided. The subject wafer has dies wherein semiconductor devices of the semiconductor design are formed and at a stage of fabrication. A current layer of the subject wafer is scanned to obtain a scanned layer/image. A master wafer comprising individual wafer/layer maps is obtained. The scanned layer is compared with a corresponding layer map. Matching and non-matching defects are identified from repetitive defects within the corresponding layer map and defects within the scanned layer. The matching defects are reviewed to classify and or identify causality. The master wafer is then updated.
REFERENCES:
patent: 5355212 (1994-10-01), Wells et al.
patent: 5991699 (1999-11-01), Kulkarni et al.
patent: 6477685 (2002-11-01), Lovelace
patent: 6883158 (2005-04-01), Sandstrom et al.
patent: 6914441 (2005-07-01), Talbot et al.
patent: 2005/0004774 (2005-01-01), Volk et al.
“Performing automated process inspection of C2-open defects using review SEM” -Xu et al, Semiconductor Manufacturing INternational Corp. (SMIC); MicroMagazine.com, Jan. 2006.
Guldi Richard L.
Park Jae H.
Ramappa Deepak A.
Brady III W. James
Masinick Michael D.
McLarty Peter K.
Telecky , Jr. Frederick J.
Texas Instruments Incorporated
LandOfFree
Methods for detecting structure dependent process defects does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Methods for detecting structure dependent process defects, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Methods for detecting structure dependent process defects will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3831348