Methods for conducting electron beam lithography

Details Methods for conducting electron beam lithography Methods for conducting electron beam lithography

1983-03-03

1984-06-12

Herbert, Jr., Thomas J.

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430269, 430323, 430331, B32B 904, G03C 500

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active

044542003

ABSTRACT:
Plasma etch durability of polymeric resists used in electron beam lithography is improved by vapor phase impregnation with an aromatic compound after development of an image. The aromatic compound should possess a polarity similar to the polymeric resist and should be relatively volatile to facilitate vapor phase diffusion.

REFERENCES:
Thompson, L. F., Solid State Technology, Jul. 1974, Part 1, pp. 27-30, and 40; Aug. 1974, Part 2, pp. 41-46.
Imamura, S., J. Electrochem. Soc., Sep. 1979, pp. 1628-1630.
Thompson et al., J. Electrochem. Soc., Oct. 1979, pp. 1699-1702, 1703-1708.
Brault et al., "A Method for Rapidly Screening Polymers as Electron-Beam Resists", Proceedings on the Symposium on Electron and Ion Beam Science and Technology, 9th Int. Conf., edited by Bakish, 1980.
Watts et al., "Solubility Ratio, Sensitivity and Line Profile Control in Positive E-Beam Resists", Proceedings on the Symposium on Electron Beam Science and Technology, 9th Int. Conf., edited by Bakish, 1980.
Martel et al., reprint from Semiconductor International, Jan.-Feb. 1979, pp. 1-8.
Thompson et al., Annual Reviews of Material Sciences, vol. 6, 1976, pp. 267-301.
Hatzakis, M., J. Vac. Sci. Technol., vol. 12, No. 6, Nov./Dec. 1975, pp. 1276-1279.
Feit et al., J. Vac. Sci. Technol., vol. 16, No. 6, Nov./Dec. 1979, pp. 1997-2002.
"Reilly Introduces Pyridine Functionality In Polymer Form"; Reilly Pyridines, 4th Edition, Reilly Tar & Chemical Corporation; Indianapolis, Indiana (1979).

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