Methods for cleaning a chamber of semiconductor device...

Details Methods for cleaning a chamber of semiconductor device... Methods for cleaning a chamber of semiconductor device...

2007-02-27

2007-02-27

Kornakov, M. (Department: 1746)

Cleaning and liquid contact with solids

Processes

Combined

C134S022180, C134S022100, C134S902000, C156S345240, C156S345250, C156S345500, C156S345260, C438S905000

Reexamination Certificate

active

11027086

ABSTRACT:
Methods for cleaning a chamber of semiconductor device manufacturing equipment are disclosed. An illustrated method comprises supplying cleaning gas into a chamber to start a cleaning process; detecting the intensity of a wavelength for the cleaning gas; fixing a valve at a predetermined position to control the pressure in the chamber; detecting the pressure in the chamber during some period of the cleaning time, the cleaning time being from the beginning of the cleaning process to the time when the intensity of the wavelength is settled at a predetermined value; and stopping supplying the cleaning gas into the chamber to complete the cleaning process.

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