Methods for characterizing defects on silicon surfaces and...

Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...

Reexamination Certificate

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C510S176000, C438S008000, C438S494000, C438S745000, C438S752000, C438S753000, C438S689000, C134S001300, C134S041000, C134S042000

Reexamination Certificate

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07579309

ABSTRACT:
The present invention relates to a method for characterizing defects on silicon surfaces, such as silicon wafers, a method for treating silicon surfaces with an etching solution, and an etching solution to be employed in the treating and defect characterization of such silicon wafer surfaces.

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