Methods for centrifugally cleaning wafer carriers

Details Methods for centrifugally cleaning wafer carriers Methods for centrifugally cleaning wafer carriers

1997-11-26

1999-10-26

El-Arini, Zeinab

Cleaning and liquid contact with solids

Processes

With work or work parts movable during treatment

134 37, 134 952, 134 953, 134 991, 1341032, 134153, 134902, B08B 302, B08B 500

Patent

active

059721278

ABSTRACT:
A process for cleaning carriers used to hold semiconductor articles includes loading a carrier on a rotor within a processing chamber. The rotor is rotated while spraying cleaning liquid onto the carrier. A flow of primary drying gas is induced through the processing chamber via the centrifugal action of the rotor. Secondary drying gas is sprayed onto the cariers from nozzles. Carriers are loaded onto carrier supports on the rotor, and are held in place with removable baskets.

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