Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2006-12-12
2006-12-12
Mancuso, Joseph (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C348S126000, C250S559450
Reexamination Certificate
active
07149343
ABSTRACT:
Described are methods and systems for providing improved defect detection and analysis using infrared thermography. Test vectors heat features of a device under test to produce thermal characteristics useful in identifying defects. The test vectors are timed to enhance the thermal contrast between defects and the surrounding features, enabling IR imaging equipment to acquire improved thermographic images. In some embodiments, a combination of AC and DC test vectors maximize power transfer to expedite heating, and therefore testing. Mathematical transformations applied to the improved images further enhance defect detection and analysis. Some defects produce image artifacts, or “defect artifacts,” that obscure the defects, rendering difficult the task of defect location. Some embodiments employ defect-location algorithms that analyze defect artifacts to precisely locate corresponding defects.
REFERENCES:
patent: 3991302 (1976-11-01), Danner
patent: 5182775 (1993-01-01), Matsui et al.
patent: 5250931 (1993-10-01), Misawa et al.
patent: 5294198 (1994-03-01), Schlagheck
patent: 5309108 (1994-05-01), Maeda et al.
patent: 5495535 (1996-02-01), Smilansky et al.
patent: 5504438 (1996-04-01), Henley
patent: 5740272 (1998-04-01), Shimada
patent: 5774573 (1998-06-01), Caspi et al.
patent: 5982945 (1999-11-01), Neff et al.
patent: 6111424 (2000-08-01), Bosacchi
patent: 6122397 (2000-09-01), Lee et al.
patent: 6269194 (2001-07-01), Nichani
patent: 6288782 (2001-09-01), Worster et al.
patent: 6289492 (2001-09-01), Dutta-Choudhury et al.
patent: 6381355 (2002-04-01), Goonetilleke
patent: 6381372 (2002-04-01), Loce
patent: 6389163 (2002-05-01), Jodoin et al.
patent: 6411731 (2002-06-01), Saito
patent: 6456899 (2002-09-01), Gleason et al.
patent: 2002/0093354 (2002-07-01), Enachescu et al.
Belikov Sergey
Enachescu Marian
Burgess & Bereznak LLP
Mancuso Joseph
Marena Systems Corporation
Yuan Kathleen
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