Methods for altering one or more parameters of a measurement...

Details Methods for altering one or more parameters of a measurement... Methods for altering one or more parameters of a measurement...

2005-01-07

2009-06-23

Azarian, Seyed (Department: 2624)

Image analysis

Applications

Biomedical applications

C382S224000, C435S007240

Reexamination Certificate

active

07551763

ABSTRACT:
Methods for altering one or more parameters of a measurement system are provided. One method includes analyzing a sample using the system to generate values from classification channels of the system for a population of particles in the sample. The method also includes identifying a region in a classification space in which the values for the populations are located. In addition, the method includes determining an optimized classification region for the population using one or more properties of the region. The optimized classification region contains a predetermined percentage of the values for the population. The optimized classification region is used for classification of particles in additional samples.

REFERENCES:
patent: 4661913 (1987-04-01), Wu et al.
patent: 5736330 (1998-04-01), Fulton
patent: 5739000 (1998-04-01), Bierre et al.
patent: 5981180 (1999-11-01), Chandler et al.
patent: 6046807 (2000-04-01), Chandler
patent: 6057107 (2000-05-01), Fulton
patent: 6139800 (2000-10-01), Chandler
patent: 6268222 (2001-07-01), Chandler et al.
patent: 6366354 (2002-04-01), Chandler
patent: 6411904 (2002-06-01), Chandler
patent: 6449562 (2002-09-01), Chandler et al.
patent: 6514295 (2003-02-01), Chandler et al.
patent: 6524793 (2003-02-01), Chandler et al.
patent: 6528165 (2003-03-01), Chandler
patent: 6586193 (2003-07-01), Yguerabide et al.
patent: 2005/0073686 (2005-04-01), Roth et al.
patent: 97/14028 (1997-04-01), None
International Search Report, PCT/US2005/000509, mailed May 6, 2005.

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