Methods, complexes, and system for forming metal-containing...

Details Methods, complexes, and system for forming metal-containing... Methods, complexes, and system for forming metal-containing...

2005-12-27

2005-12-27

Kielin, Erik (Department: 2813)

Coating apparatus

Gas or vapor deposition

Crucible or evaporator structure

C438S503000, C438S507000, C546S002000, C556S001000, C556S175000, C556S176000, C987S002000

Reexamination Certificate

active

06979370

ABSTRACT:
A method of forming a film on a substrate using Group IIIA metal complexes. The complexes and methods are particularly suitable for the preparation of semiconductor structures using chemical vapor deposition techniques and systems.

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