Methods, apparatus and computer program products for self-calibr

Details Methods, apparatus and computer program products for self-calibr Methods, apparatus and computer program products for self-calibr

1997-03-03

1998-08-25

Trammell, James P.

Electricity: electrical systems and devices

Electrolytic systems or devices

Liquid electrolytic capacitor

364560, 36457101, G01B 700

Patent

active

057989478

ABSTRACT:
Methods, apparatus and computer program products for selfcalibrating two-dimensional metrology stages include using a rigid artifact plate having an N.times.N array of marks thereon to map each of a two-dimensional array of stage positions (u,v) to a corresponding position in a Cartesian coordinate grid (x,y) to determine the distortion functions G.sub.x (x,y) and G.sub.y (x,y). This mapping function is performed by a series of operations which preferably use an orthogonal Fourier series to decouple determination of a pivoting point and a rotation angle from determination of the distortion functions. These operations include, among other things, determining complete and incomplete non-four-fold rotationally symmetric distortion between the two-dimensional array of stage positions (u,v) and the Cartesian coordinate grid (x,y). Operations are then performed to decouple the determination of the pivoting point and the rotation angle from the determination of the distortion functions G.sub.x (x,y) and G.sub.y (x,y) by determining (i) a two-dimensional translation misalignment error and a rotation misalignment error from the complete and incomplete non-four-fold rotationally symmetric distortion and then determining (ii) complete four-fold rotationally symmetric distortion between the two-dimensional array of stage positions and the Cartesian coordinate grid from, among other things, the two-dimensional translation misalignment error and the rotation misalignment error. These operations provide a highly efficient method of self-calibrating metrology and lithography stages.

REFERENCES:
patent: 4583298 (1986-04-01), Raugh
Takac et al., Self-Calibration In Two Dimensions: The Experiment, SPIE Proceedings on "Metrology, Inspection and Process Control for Microlithography X", Santa Clara, California, vol. 2725, Mar. 11-13, 1996, pp. 130-146.
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Kuniyoshi et al., Stepper Stability Improvement By A Perfect Self-Calibration System, SPIE vol. 2197, pp. 990-996.
Lawson et al., Calibration Algorithms For An Electron Beam Metrology System, Microelectronic Engineering 1 (1983), pp. 41-50.
Takac, Self-Calibration In One Dimension, SPIE vol. 2087, Photomask Technology and Management (1993), pp. 80-86.
Raugh, Absolute 2-D Sub-Micron Metrology For Electron Beam Lithography, SPIE vol. 480, Intgrated Circuit Metrology II (1984), pp. 145163.
Jun Ye, Errors in High-Precision Mask Making and Metrology, Solid State Electronics Laboratory, Semiconductor Research Corporation Contract No. MC-515, Mar. 1996, pp. 1-167.

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