Methods and sytems for the destruction of perfluorinated...

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Halogenous component

Reexamination Certificate

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C095S199000, C095S211000, C095S233000, C095S237000, C096S234000, C096S290000, C422S168000, C422S169000, C422S177000, C423S245100, C423S245300

Reexamination Certificate

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08080226

ABSTRACT:
Methods and systems for the destruction of one or more PFCs in a gas stream are provided. The gas stream can come from semiconductor processing, for example. The PFCs in the gas stream are reacted with steam in the presence of a catalyst to fragment the PFCs into other compounds that are readily removed from the gas stream. The catalyst comprises gallium, and can additionally comprise zirconium oxide. The gas stream can also be pre-treated prior to reacting the PFCs with steam to remove substances that could be deleterious to the catalyst.

REFERENCES:
patent: 6849573 (2005-02-01), Haga et al.
patent: 2003/0049182 (2003-03-01), Hertzler et al.

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