Methods and systems to compensate for a stitching...

Details Methods and systems to compensate for a stitching... Methods and systems to compensate for a stitching...

2003-09-30

2008-08-12

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S312000, C430S394000, C430S396000, C355S077000

Reexamination Certificate

active

07410736

ABSTRACT:
A method and system are provided for forming a pattern within an area of a photosensitive surface. An exemplary method includes performing a first exposure of the photosensitive surface in accordance with predetermined image data, wherein the first exposure occurs during a first pass and produces a first image within the area. The image data is adjusted to compensate for identified image deficiencies image deficiencies, the image deficiencies being within a region of the first image. A second exposure, of the photosensitive surface, is performed in accordance with the adjusted image data during a second pass.

REFERENCES:
patent: 5229872 (1993-07-01), Mumola
patent: 5296891 (1994-03-01), Vogt et al.
patent: 5500736 (1996-03-01), Koitabashi et al.
patent: 5523193 (1996-06-01), Nelson
patent: 5530482 (1996-06-01), Gove et al.
patent: 5579147 (1996-11-01), Mori et al.
patent: 5677703 (1997-10-01), Bhuva et al.
patent: 5808797 (1998-09-01), Bloom et al.
patent: 5982553 (1999-11-01), Bloom et al.
patent: 6133986 (2000-10-01), Johnson
patent: 6177980 (2001-01-01), Johnson
patent: 6285488 (2001-09-01), Sandstrom
patent: 6399261 (2002-06-01), Sandstrom
patent: 6428940 (2002-08-01), Sandstrom
patent: 6687041 (2004-02-01), Sandstrom
patent: 6747783 (2004-06-01), Sandstrom
patent: 6795169 (2004-09-01), Tanaka et al.
patent: 6806897 (2004-10-01), Kataoka et al.
patent: 6811953 (2004-11-01), Hatada et al.
patent: 6876440 (2005-04-01), Bleeker et al.
patent: 2004/0041104 (2004-03-01), Liebregts et al.
patent: 2004/0130561 (2004-07-01), Jain
patent: 2005/0007572 (2005-01-01), George et al.
patent: 1-276717 (1989-11-01), None
patent: 5-136020 (1993-06-01), None
patent: 2001-217178 (2001-08-01), None
patent: WO 98/33096 (1998-07-01), None
patent: WO 98/38597 (1998-09-01), None
patent: WO 98/38597 (1998-09-01), None
patent: WO 99/45436 (1999-09-01), None
Cobb et al., “Fast, Low-Complexity Mask Design”,Optical/Laser Microlithography VIII, SPIE, Feb. 22-24, 1995, vol. 2440, pp. 313-327.
Office Action for Japanese patent application No. 2004-288293, dated Sep. 4, 2007, 3 pages.
Office Action for Japanese Patent Application No. 2004-288293 drafted on Jan. 9, 2008, 3 pgs.

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