Methods and systems for substrate surface evaluation

Details Methods and systems for substrate surface evaluation Methods and systems for substrate surface evaluation

2006-02-07

2006-02-07

Toatley, Gregory J. (Department: 2877)

Optics: measuring and testing

Of light reflection

C356S369000, C356S237200, C359S370000, C359S371000, C382S168000

Reexamination Certificate

active

06995847

ABSTRACT:
A method for determining a surface quality of a substrate sample using a differential interference contrast microscope is described. The microscope includes an eyepiece, an eyepiece focus adjustment, a microscope focus adjustment, a light source, at least one of an aperture or reticule, a camera view, a prism and an eyepiece. The method includes calibrating the focus of the eyepiece with the focus of the camera and determining a peak response ratio for the microscope through adjustment of phase between differential beams of the microscope. The substrate sample is placed under the microscope, illuminated with the light source, and brought into focus with the microscope focus. Phase between differential beams is adjusted, at least one image of the substrate sample is captured and processed to determine a level of surface structure on the substrate sample.

REFERENCES:
patent: 4200354 (1980-04-01), Hoffman
patent: 5317644 (1994-05-01), Kenyon et al.
patent: 5796517 (1998-08-01), Sensui et al.
patent: 5808735 (1998-09-01), Lee et al.
patent: 6496308 (2002-12-01), Yonetani et al.
patent: 6690473 (2004-02-01), Stanke et al.
patent: 6826310 (2004-11-01), Trifonov et al.
patent: 2001/0040723 (2001-11-01), Kusaka
patent: 2003/0161038 (2003-08-01), Tobben et al.
patent: 36 04 142 (1987-08-01), None
patent: 43 11 726 A 1 (1995-01-01), None
patent: 0 444 450 (1991-09-01), None
Hartman J.S. et al: “Quantitative Surface Topography Determination by Nomarski Reflection Microscopy. 2: Microscope Modification, Calibration, and Planar Sample Experiments”.
“Quantitative Surface Topography and Micro Curvature Analysis Using White Light Interference Contrast Microscopy”, IBM Technical Disclosure Bulletin, IBM Corp. New York, US.

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