Etching a substrate: processes – Forming or treating thermal ink jet article
Reexamination Certificate
2007-01-16
2007-01-16
Norton, Nadine (Department: 1765)
Etching a substrate: processes
Forming or treating thermal ink jet article
Reexamination Certificate
active
10850732
ABSTRACT:
The described embodiments relate to slotted substrates. One exemplary method forms a feature into a substrate, at least in part, by directing a laser beam at the substrate. During at least a portion of said directing, the method supplies a conductive material proximate the substrate.
REFERENCES:
patent: 4437109 (1984-03-01), Anthony et al.
patent: 4766009 (1988-08-01), Imura et al.
patent: 5468652 (1995-11-01), Gee
patent: 5543365 (1996-08-01), Wills et al.
patent: 6117706 (2000-09-01), Yoshioka et al.
patent: 2004/0140534 (2004-07-01), Yoshihara et al.
patent: 2004/0159951 (2004-08-01), Toyoda et al.
patent: 3937460 (1990-11-01), None
patent: 19856346 (2000-06-01), None
patent: 1293316 (2003-03-01), None
patent: 1533069 (2005-05-01), None
patent: WO8903274 (1989-04-01), None
Gates Craig M.
Huth Mark
Kabalnov Alexey S
Khavari Mehrgan
Mcclelland Sean P
Dahimene Mahmoud
Hewlett--Packard Development Company, L.P.
Norton Nadine
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