Methods and systems for handling a workpiece in vacuum-based...

Details Methods and systems for handling a workpiece in vacuum-based... Methods and systems for handling a workpiece in vacuum-based...

2007-05-01

2007-05-01

Rinehart, Kenneth (Department: 3749)

Drying and gas or vapor contact with solids

Process

Gas or vapor contact with treated material

C034S403000

Reexamination Certificate

active

10985727

ABSTRACT:
Methods and systems are provided for handling an item in a vacuum-based handling system for semiconductor manufacturing. The methods include providing a heater or dryer for the load lock of the handling system that dries a semiconductor wafer during the pumping down of the load lock.

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