Methods and devices for high throughput crystallization

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With decomposition of a precursor

Reexamination Certificate

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C117S089000, C117S092000

Reexamination Certificate

active

10432079

ABSTRACT:
Crystallization Photoresist (PR) apparatus and methods which allow for fast screening and determination of protein crystallization conditions with small protein quantities and rapid crystallization. The apparatus comprise a first region comprising a first nucleation catalyst material and a second region comprising a second nucleation catalyst material, with the first and second regions positioned adjacent to each other and configured to support at least one crystal, and with the first region having a variation in a nucleation property of the first nucleation catalyst material in the first region. The crystal may be supported at an interface of the adjacent regions. The methods comprise providing a first region of a first nucleation catalyst material and a second region of a second nucleation catalyst material adjacent said first region, with the first region having a variation in a nucleation property of the first nucleation catalyst material, exposing the first and second regions to a solution of a selected molecule, and growing at least one crystal of the molecule in association with the first and second regions.

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patent: WO 00/60345 (2000-10-01), None
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Pubilcation: Journal of Crystal Growth, vol. 174 Date: (1997) Title: Application of Exhaustive Lattice Match Searches to the Selection of Epitaxial Susbtrates for Protein Crystal Growth Author: Paul J. Shlichts pp. 480-486.

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