Methods and apparatuses for image exposure correction

Details Methods and apparatuses for image exposure correction Methods and apparatuses for image exposure correction

2007-05-31

2010-12-28

Chan, Jason (Department: 2622)

Television

Camera, system and detail

Still and motion modes of operation

C348S362000, C396S166000

Reexamination Certificate

active

07859573

ABSTRACT:
Methods and apparatuses for image exposure include capturing a first image under a first illumination condition, determining a luminance of the first image at a plurality of sectors, capturing a second image under a second illumination condition employing an artificial light source, determining a luminance of the second image at the plurality of sectors, and determining if the artificial light source should be used to capture a final image using the luminances of the first and second images at the plurality of sectors. If the artificial light source is to be used, an output level of the light source is determined.

REFERENCES:
patent: 5121155 (1992-06-01), O'Such et al.
patent: 6185374 (2001-02-01), Yamaguchi et al.
patent: 6272292 (2001-08-01), Iwasaki et al.
patent: 2001/0019364 (2001-09-01), Kawahara
patent: 2002/0197071 (2002-12-01), Hofer
patent: 2003/0063907 (2003-04-01), Muramatsu
patent: 2006/0039690 (2006-02-01), Steinberg et al.
patent: 2006/0044422 (2006-03-01), Miyazaki
patent: 2007/0110427 (2007-05-01), Tsai
patent: 1 775 940 (2007-04-01), None
patent: WO 97/36427 (1997-10-01), None
International Search Report for PCT/US2008/063048, filed Aug. 05, 2008.

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