Methods and apparatuses for configuring radiation in...

Photocopying – Projection printing and copying cameras – Illumination systems or details

Reexamination Certificate

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Reexamination Certificate

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07446855

ABSTRACT:
Methods and apparatuses for configuring radiation used in microlithographic processing of workpieces are disclosed herein. One particular embodiment of such a method comprises directing a radiation beam along a radiation path from a reticle to an adjustment structure. The radiation beam has a wavefront with a first configuration in an image plane generally transverse to the radiation path. The method continues by changing at least one independently controllable parameter of the adjustment structure to change the wavefront of the radiation beam from the first configuration to a second configuration. After changing the shape of the wavefront from the first configuration to the second configuration, the method continues by impinging the radiation beam on the workpiece.

REFERENCES:
patent: 4988188 (1991-01-01), Ohta
patent: 5142132 (1992-08-01), MacDonald et al.
patent: 5194893 (1993-03-01), Nishi
patent: 5300971 (1994-04-01), Kudo
patent: 5436464 (1995-07-01), Hayano et al.
patent: 5602620 (1997-02-01), Miyazaki et al.
patent: 5610684 (1997-03-01), Shiraishi
patent: 5631721 (1997-05-01), Stanton et al.
patent: 5661546 (1997-08-01), Taniguchi
patent: 5684566 (1997-11-01), Stanton
patent: 5721608 (1998-02-01), Taniguchi
patent: 5796467 (1998-08-01), Suzuki
patent: 5883700 (1999-03-01), Someya
patent: 5907392 (1999-05-01), Makinouchi
patent: 5969800 (1999-10-01), Makinouchi
patent: 6084244 (2000-07-01), Saiki et al.
patent: 6188464 (2001-02-01), Makinouchi
patent: 6215578 (2001-04-01), Lin
patent: 6251550 (2001-06-01), Ishikawa
patent: 6259513 (2001-07-01), Gallatin et al.
patent: 6285440 (2001-09-01), Takahashi
patent: 6285488 (2001-09-01), Sandstrom
patent: 6291110 (2001-09-01), Cooper et al.
patent: 6379867 (2002-04-01), Mei et al.
patent: 6392740 (2002-05-01), Shiraishi et al.
patent: 6498685 (2002-12-01), Johnson
patent: 6501532 (2002-12-01), Suzuki
patent: 6504644 (2003-01-01), Sandstrom
patent: 6532056 (2003-03-01), Osakabe et al.
patent: 6549266 (2003-04-01), Taniguchi
patent: 6577379 (2003-06-01), Boettiger et al.
patent: 6586160 (2003-07-01), Ho et al.
patent: 6674512 (2004-01-01), Novak et al.
patent: 6707534 (2004-03-01), Bjorklund et al.
patent: 6710854 (2004-03-01), Shiraishi et al.
patent: 6784975 (2004-08-01), Boettiger et al.
patent: 6794100 (2004-09-01), Boettiger et al.
patent: 6816302 (2004-11-01), Sandstrom et al.
patent: 6844972 (2005-01-01), McGuire, Jr.
patent: 6894765 (2005-05-01), Mackey et al.
patent: 6897943 (2005-05-01), Schroeder et al.
patent: 6900827 (2005-05-01), Taniguchi
patent: 7038762 (2006-05-01), Boettiger et al.
patent: 7046340 (2006-05-01), Boettiger et al.
patent: 7053987 (2006-05-01), Mackey et al.
patent: 7130022 (2006-10-01), Mackey et al.
patent: 2004/0013956 (2004-01-01), Sogard
patent: 2004/0057030 (2004-03-01), Okubo et al.
patent: 2006/0092393 (2006-05-01), Harmed et al.
patent: 2006/0158631 (2006-07-01), Boettiger et al.
patent: 2006/0181692 (2006-08-01), Boettiger et al.
patent: 11-231234 (1999-08-01), None
patent: WO-00/79345 (2000-12-01), None
Boulder Nonlinear Systems, “256×256 Multi-level/Analog Liquid Crystal Spatial Light Modulator,” 2 pages, <http://www.bnonlinear.com/papers/256SLM.pdf>.
Boulder Nonlinear Systems, “512×512 Multi-level/Analog Liquid Crystal Spatial Light Modulator,” 2 pages, <http://www.bnonlinear.com/papers/512SLM.pdf>.
Boulder Nonlinear Systems, “Liquid Crystal Rotators—Ferroelectric and Nematic,” 2 pages, <http://www.bnonlinear.com/papers/rotors.pdf>.
Boulder Nonlinear Systems, “Liquid Crystal Shutters / Variable Optical Attenuaters—Ferroelectric and Nematic,” 2 pages, <http://www.bnonlinear.com/papers/shutters.pdf>.
Brunner, T.A., “Impact of lens aberrations on optical lithography,” Optical Lithography, vol. 41, Nos. 1/2, 1997, <http://www.research.ibm.com/journal/rd/411/brunner.html>.
CRL Opto Limited, LCS2-G Datasheet, 4 pages, 2002, <http://www.crlopto.com/products/datasheets/files/LCS2-datasheet.pdf>.
Digital Optics Corporation, “Pattern Generators,” 1 page, 2002, retrieved from the Internet on Jul. 30, 2003, <http://www.digitaloptics.com/products—ind.asp?pid=55>.
Farsari, M. et al., “Microfabrication by use of a spatial light modulator in the ultraviolet: experimental results,” Optics Letters, vol. 24, No. 8, pp. 549-550, Apr. 15, 1999, Optical Society Of America, Washington, DC.
Fukuda, H. et al., “Improvement of defocus tolerance in a half-micron optical lithography by the focus latitude enhancement exposure method: Simulation and experiment,” J. Vac. Sci. Technol B., vol. 7 No. 4, Jul./Aug. 1989, pp. 667-674.
Hamamatsu Photonics K.K., “PPM—Programmable Phase Modulator,” 4 pages, Sep. 2000, <http://www.hamamatsu.com>.
Micro-Optics, Inc., “Polarzation Maintaining Faraday Rotator (PMFR),” 1 page, retrieved from the Internet on Jul. 30, 2003, <http://www.microopticsinc.com/PMFR.html>.
Optics.org, “Micronic and Fraunhofer Develop New Pattern Generators,” 1 page, Dec. 10, 1999, <http://www.optics.org>.
Texas Instruments Incorporated, “What the Industry Experts Say About Texas Instruments Digital MicroMirror Display (DMD) Technology,” 2 pages, Jun. 1994.

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