Methods and apparatus for minimizing white point defects in quar

Details Methods and apparatus for minimizing white point defects in quar Methods and apparatus for minimizing white point defects in quar

1998-11-19

2000-11-07

Utech, Benjamin L.

Single-crystal, oriented-crystal, and epitaxy growth processes;

Apparatus

For crystallization from liquid or supercritical state

117900, 65 173, 65 174, 65 71, 65144, 65302, C30B 1510

Patent

active

061430730

ABSTRACT:
Methods and apparatus for manufacturing silica crucibles 9 containing few, if any, white point defects. The white point defects are reduced by decreasing the amount of silica vapor condensing on electrodes 4,5,6 used in the manufacturing process. The silica vapor condensation is decreased by providing a flow of a protective or non-reactive gas or gas mixture through protective devices 11,12,13, over portions of the electrodes where the silica vapor would otherwise condense.

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