Methods and apparatus for measuring and dispensing processing so

Details Methods and apparatus for measuring and dispensing processing so Methods and apparatus for measuring and dispensing processing so

1996-10-02

1999-01-12

Rose, Robert A.

Abrading

Precision device or process - or with condition responsive...

Computer controlled

451 60, 451285, 451286, 451287, 451446, 222 63, B24B 4916

Patent

active

058578935

ABSTRACT:
Methods and apparatus for measuring and controlling the flow rates of processing solutions to a CMP machine during the polishing and planarization process. The apparatus comprises a processing solution source, a processing solution dispensing system for applying the solution to the CMP machine, a mechanism for transferring the processing solution from the solution source to the dispensing system, and a metering or sensing system for accurately measuring the amount of processing solution actually dispensed to the CMP machine. Preferably, the metering system comprises a coriolis mass flow meter and a controller for controlling its operation. The metering system may interface with the CMP machine controller in a feed-back loop configuration so that the actual flow rates of the solutions may be controlled in real time.

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