Data processing: measuring – calibrating – or testing – Measurement system – Temperature measuring system
Reexamination Certificate
2007-11-20
2007-11-20
Ramos-Feliciano, Eliseo (Department: 2857)
Data processing: measuring, calibrating, or testing
Measurement system
Temperature measuring system
Reexamination Certificate
active
11177922
ABSTRACT:
This invention seeks to provide methods and apparatus that can improve the accuracy of measured parameter data used for processing workpieces. One aspect of the present invention includes methods of measuring process conditions with low distortion of the measurements caused by the measuring apparatus. The measurements include data for applications such as data for monitoring, controlling, and optimizing processes and process tools. Another aspect of the present invention includes apparatus for measuring substantially correct data for applications such as generating data for monitoring, controlling, and optimizing processes and process tools.
REFERENCES:
patent: 5444637 (1995-08-01), Smesny et al.
patent: 5907820 (1999-05-01), Pan
patent: 5967661 (1999-10-01), Renken et al.
patent: 5969639 (1999-10-01), Lauf et al.
patent: 6033922 (2000-03-01), Rowland et al.
patent: 6244121 (2001-06-01), Hunter
patent: 6542835 (2003-04-01), Mundt
patent: 6691068 (2004-02-01), Freed et al.
patent: 6738722 (2004-05-01), Polla et al.
patent: 6741945 (2004-05-01), Polla et al.
patent: 6889568 (2005-05-01), Renken
patent: 2003/0101006 (2003-05-01), Mansky et al.
U.S. Appl. No. 60/586,891, filed Jul. 10, 2004, Inventor(s) Dean Hunt, Costas J. Spanos, Michael Welch, and Kameshwar Poolla.
Freed Mason L.
Hunt Dean
Poolla Kameshwar
Spanos Costas J.
Welch Michael
Charioui Mohamed
OnWafer Technologies, Inc.
Ramos-Feliciano Eliseo
Williams Larry
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