Methods and apparatus for dispensing semiconductor...

Details Methods and apparatus for dispensing semiconductor... Methods and apparatus for dispensing semiconductor...

2006-01-30

2009-02-03

Bashore, Alain L (Department: 1792)

Coating processes

Spraying

C427S425000, C427S427200, C118S313000, C118S319000, C118S321000, C118S323000, C118S052000, C222S386000

Reexamination Certificate

active

07485346

ABSTRACT:
Methods and apparatus for controllably dispensing photoresist solutions and other fluids in semiconductor manufacturing equipment from an array of syringe-based fluid dispensers. A multi-syringe fluid dispensing system is provided for photoresist coating within a wafer track coating module. The coating module may contain a spin chuck that is positioned within a catch cup. A robotic dispense arm and gripper assembly may be positioned within the coating module for gripping and positioning a fluid syringe. An array of syringes may be stored on a solution tray within the wafer track coating module for holding a plurality of fluid syringes containing photoresist solutions.

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