Methods and apparatus for deposition of thin films

Details Methods and apparatus for deposition of thin films Methods and apparatus for deposition of thin films

2007-04-24

2007-04-24

Meeks, Timothy (Department: 1762)

Coating processes

Coating by vapor, gas, or smoke

C427S255230, C427S255280, C427S255290, C427S255310, C427S255320, C427S255393, C427S255395, C427S255700

Reexamination Certificate

active

10108140

ABSTRACT:
A method for depositing a thin film includes the steps of providing a vapor including at least one selected vapor phase component into an evacuated chamber and condensing the vapor onto a heated substrate to form a liquid phase deposit wherein a temperature of the substrate is lower than the condensation temperature of the component. The liquid deposit is then cooled to produce a solid phase film. The invention can provide two or more vapor phase components. The invention can be used to deposit a wide variety of layers, including thin films of metallic, semiconductor and nonmetallic inorganic materials. The invention is useful for forming solid electrolytes and the electrodes for batteries, fuel cells and other electromagnetically active devices.

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