Methods and apparatus for data analysis

Data processing: measuring – calibrating – or testing – Measurement system – Performance or efficiency evaluation

Reexamination Certificate

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Reexamination Certificate

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08041541

ABSTRACT:
A method and apparatus for data analysis according to various aspects of the present invention is configured to automatically identify a characteristic of a fabrication process for components based on test data for the components.

REFERENCES:
patent: 5566092 (1996-10-01), Wang et al.
patent: 5787190 (1998-07-01), Peng et al.
patent: 5844850 (1998-12-01), Tsutsui et al.
patent: 6009545 (1999-12-01), Tsutsui et al.
patent: 6090044 (2000-07-01), Bishop et al.
patent: 6327550 (2001-12-01), Vinberg et al.
patent: 6701003 (2004-03-01), Feinstein
patent: 7080057 (2006-07-01), Scarborough et al.
patent: 7155652 (2006-12-01), Shetty
patent: 7225107 (2007-05-01), Buxton et al.
patent: 7356430 (2008-04-01), Miguelanez et al.
patent: 2003/0004402 (2003-01-01), Hitt et al.
patent: 2003/0228049 (2003-12-01), Asai
patent: 2005/0043593 (2005-02-01), Hitt et al.
patent: 2005/0096873 (2005-05-01), Klein
patent: 2006/0064415 (2006-03-01), Guyon et al.
patent: 2006/0074824 (2006-04-01), Li
patent: 2008/0021677 (2008-01-01), Buxton et al.
patent: 2000116003 (2000-04-01), None
Sivaramakrishna, “Hu's moment invariants”, May 1997, IEEE, pp. 292-295.
Chen et al., “A Neural-Network Approach to Recognize Defect Spatial Pattern in Ssemiconductor Fabrication”, Aug. 2000, IEEE, pp. 366-373.

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