Methods and apparatus for controlling film deposition

Details Methods and apparatus for controlling film deposition Methods and apparatus for controlling film deposition

1993-03-24

1993-11-16

Bueker, Richard

Coating processes

Measuring, testing, or indicating

Thickness or uniformity of thickness determined

427 10, 4272481, 4272555, 4272557, 118664, 118718, 118726, 118727, 118729, C23C 1424, C23C 1454

Patent

active

052621944

ABSTRACT:
Apparatus and method for increasing the time that a quartz crystal can sense the rate at which evaporated material is broadcast onto a substrate wherein a chopper employing a disk with a slot is disposed between the source of the evaporated material and the crystal to reduce the exposure of the crystal to evaporated material to a fraction of the time that the substrate is exposed wherein the chopper frequency is not in tune with the dither frequency of the material evaporator. Barrier means prevents the chopper slot from significantly changing dimensions due to the build up of material on its defining edges, while shield means prevents the a crystal from being exposed to evaporated material from a source that it does not control.

REFERENCES:
patent: 3383238 (1968-05-01), Unzicker
patent: 4579083 (1986-04-01), Boivin
patent: 4669418 (1987-06-01), Dwyer

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