Methods and apparatus for contamination control in plasma proces

Electric heating – Metal heating – By arc

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21912141, 21912143, 156345, 20429831, B23K 900

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053671392

ABSTRACT:
Contamination levels in plasma processes are reduced during plasma processing, by prevention of formation of particles, by preventing entry of particles externally introduced or by removing particles spontaneously formed from chemical and/or mechanical sources. Some techniques for prevention of formation of particles include interruption of the plasma by pulsing the source of plasma energy periodically, or application of energy to provide mechanical agitation such as mechanical shockwaves, acoustic stress, ultrasonic stress, vibrational stress, thermal stress, and pressure stress. Following a period of applied stress, a tool is pumped out (if a plasma is used, the glow is first discontinued), vented, opened and flaked or particulate material is cleaned from the lower electrode and other surfaces. A burst of filtered air or nitrogen, or a vacuum cleaner is used for removal of deposition debris while the vented tool is open.

REFERENCES:
patent: 4401507 (1983-08-01), Engle
patent: 4475921 (1984-10-01), Barmatz
patent: 4500563 (1985-02-01), Ellenberger
patent: 4657616 (1987-04-01), Benzing et al.
patent: 4698130 (1987-10-01), Restall et al.
patent: 4786352 (1988-11-01), Benzing
patent: 4795880 (1989-01-01), Hayes et al.
patent: 4816113 (1989-03-01), Yamazaki
patent: 4927485 (1990-05-01), Cheng et al.
patent: 4960488 (1990-10-01), Law
IBM Technical Disclosure Bulletin, entitled "Removing Quartz Flakes From Surfaces by Sound Energy", by Hafner, et al., vol. 17, No. 2 Jul. 1974, p. 452.
Journal of Vacuum Science and Technology: Part A, entitled in "In Situ Laser Diagnostic Studies of Plasma-Generated Particulate Contamination", by Selwyn, et al., vol. 4, No. 4, Jul. 1989, pp. 2758-2765.
In situ laser diagnostic studies of plasma-generated particulate contamination by G. S. Selwyn J. Vac. Sci. Technol. A7(4) Jul./Aug. 1989, pp. 2758-2765.
Spatial dependence of particle light scattering in an rf silane discharge by R. M. Roth, K. G. Spears, G. D., Stein and G. Wong Appl. Phys. Lett. 46(3), 1 Feb. 1985, pp. 253-255.
Detection of Cl and chlorine-containing negative ions in rf plasmas by two-photon laser-induced fluorescence by G. S. Selwyn, Appl. Phys. Lett. 51(12), 21 Sep. 1987 pp. 898-900.

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