Methods and apparatus for altering material using ion beams

Details Methods and apparatus for altering material using ion beams Methods and apparatus for altering material using ion beams

1994-10-04

1996-07-02

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

2504923, 2504921, G21K 504

Patent

active

055324959

ABSTRACT:
A method and apparatus for treating material surfaces using a repetitively pulsed ion beam. In particular, a method of treating magnetic material surfaces in order to reduce surface defects, and produce amorphous fine grained magnetic material with properties that can be tailored by adjusting treatment parameters of a pulsed ion beam. In addition to a method of surface treating materials for wear and corrosion resistance using pulsed particle ion beams.

REFERENCES:
patent: 4447761 (1984-05-01), Stinnett
patent: 4587430 (1986-05-01), Adler
patent: 4733073 (1988-03-01), Becker et al.
patent: 4733091 (1988-03-01), Robinson
patent: 4764394 (1988-08-01), Conrad
Harjes et al., "Status of the Repetetive High Energy Pulsed Power Project", 8th IEEE International Pulsed Power Conference, pp. 543-548, Jun. 1991.
Greenly et al., "Plasma-Anode Ion Diode Research at Cornell" 8th Intl. Conf. on High-Power Particle Beams, pp. 199-206, Jul. 1990.
Stinnet et al., "Surface Treatment With Pulsed Ion Beams", Division of Plasma Physics, Seattle, WA, Nov. 1992.

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