Electricity: measuring and testing – Impedance – admittance or other quantities representative of... – Lumped type parameters
Reexamination Certificate
2006-11-28
2006-11-28
Deb, Anjan (Department: 2858)
Electricity: measuring and testing
Impedance, admittance or other quantities representative of...
Lumped type parameters
C438S379000, C257S312000
Reexamination Certificate
active
07141989
ABSTRACT:
A micro-electro mechanical system (MEMS) variable capacitor (varactor) generally includes a substrate (102), a first capacitive plate (112) formed on the substrate, a flexible structure (150) coupled to the substrate, a second capacitive plate (116) and a first electrode (122) formed on the flexible structure; a package seal (104) coupled to the substrate and having a second electrode (106) formed thereon, wherein the distance between the first capacitive plate and the second capacitive plate (and hence, the capacitance of the structure) is responsive to a bias voltage applied to the electrodes.
REFERENCES:
patent: 5847453 (1998-12-01), Uematsu et al.
patent: 6355534 (2002-03-01), Cheng
patent: 6387769 (2002-05-01), Dekker et al.
patent: 6441449 (2002-08-01), Xu et al.
patent: 6507475 (2003-01-01), Sun
patent: 6803774 (2004-10-01), Park
Yeh, Chingwen and Najafi, Khalil; A Low-Voltage Tunneling-Based Silicon Microaccelermeter, IEEE Transactions on Electron Devices, vol. 44, No. 11 pp. 1875-1882 , Nov. 1997.
Gogoi, Bishnu; Wang, Chuan Che; Mastrangelo, Carlos; Force Balanced Micromachined Pressure Sensors, IEEE Transactions on Electron Devices, vol. 48, No. 8, pp. 1575-1584, Aug. 2001.
Deb Anjan
Freescale Semiconductor Inc.
Ingrassia Fisher & Lorenz
LandOfFree
Methods and apparatus for a MEMS varactor does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Methods and apparatus for a MEMS varactor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Methods and apparatus for a MEMS varactor will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3677493