Methodology for monitoring solvent quality

Details Methodology for monitoring solvent quality Methodology for monitoring solvent quality

1994-12-14

1997-09-23

Snay, Jeffrey

Chemistry: analytical and immunological testing

Condition responsive control

134 18, G01N 3500

Patent

active

056703767

ABSTRACT:
The quality of solvents used in semiconductor manufacturing for removing photoresist or post halogen etch cleanup is monitored by measuring the conductivity of the solvents.

REFERENCES:
patent: 4682113 (1987-07-01), Barben, II
patent: 4795497 (1989-01-01), McConnell et al.
patent: 4824763 (1989-04-01), Lee
patent: 4857750 (1989-08-01), Millis et al.
patent: 5091103 (1992-02-01), Dean et al.
patent: 5225048 (1993-07-01), Yuan
patent: 5364510 (1994-11-01), Carpio
Patent Abstract of JP-A-62 091105 (Katsura Shigeo) Apr. 1993.

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