X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1990-03-14
1991-03-26
Westin, Edward P.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 71, 378 89, 378 54, 378 55, G01N 2320, H05G 108, G01B 1502
Patent
active
050035690
ABSTRACT:
A thickness determination method for organic films comprises the steps of: irradiating an organic film to be measured with x-rays at a certain angle of incidence, finding an angle of reflection at which the x-ray intensity reaches a peak, and finding the thickness of the film from the angle of this peak.
REFERENCES:
patent: 2428796 (1947-10-01), Frideman
patent: 4426719 (1984-01-01), Fraenkel
patent: 4764945 (1988-08-01), Tadahiro
Kato Masao
Matsuda Hiro
Nakanishi Hachiro
Okada Shuji
Agency of Industrial Science & Technology
Ministry of International Trade & Industry
Westin Edward P.
Wong Don
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