Etching a substrate: processes – Forming or treating an article whose final configuration has...
Reexamination Certificate
2011-07-12
2011-07-12
Vinh, Lan (Department: 1713)
Etching a substrate: processes
Forming or treating an article whose final configuration has...
C216S022000, C428S848000
Reexamination Certificate
active
07976715
ABSTRACT:
A method for making a master mold that is used in the nanoimprinting process to make patterned-media disks with patterned data islands uses guided self-assembly of a block copolymer into its components. Conventional or e-beam lithography is used to first form a pattern of generally radial stripes on a substrate, with the stripes being grouped into annular zones or bands. A block copolymer material is then deposited on the pattern, resulting in guided self-assembly of the block copolymer into its components to multiply the generally radial stripes into generally radial lines. Various methods, including conventional lithography, guided self-assembly of a second block copolymer, and e-beam lithography, are then used to form concentric rings over the generally radial lines. After etching and resist removal, the master mold has a pattern of either pillars or holes, depending on the method used.
REFERENCES:
patent: 5766718 (1998-06-01), Matsuda et al.
patent: 6042998 (2000-03-01), Brueck et al.
patent: 6421195 (2002-07-01), Rubin et al.
patent: 6746825 (2004-06-01), Nealey et al.
patent: 7080596 (2006-07-01), Lee et al.
patent: 7347953 (2008-03-01), Black et al.
patent: 7521094 (2009-04-01), Cheng et al.
patent: 2002/0168548 (2002-11-01), Sakurai et al.
patent: 2004/0241574 (2004-12-01), Dai et al.
patent: 2005/0094549 (2005-05-01), Hieda et al.
patent: 2006/0134556 (2006-06-01), Nealey et al.
patent: 2006/0276043 (2006-12-01), Johnson et al.
patent: 2007/0092650 (2007-04-01), Albrecht et al.
patent: 2007/0121375 (2007-05-01), Sewell
patent: 2008/0192606 (2008-08-01), Kimura et al.
patent: 2000113533 (2000-04-01), None
patent: 2007058324 (2007-05-01), None
Naito, Katsuyuki; Hieda, Hiroyuki; Sakurai, Masatoshi; Kamata, Yoshiyuki; Asakawa, Koji. 2.5-inch Disk Patterned Media Prepared by an Artificially Assisted Self-Assembling Method. IEEE Transactions on Magnetics. vol. 38, No. 5 Sep. 2002.
Park, Sang-Min; Stoykovich, Mark P.; Ruiz, Ricardo; Zhang, Ying; Black, Charles T.; Nealey, Paul F. Directed Assembly of Lamellae-Forming BLock Copolymers by Using Chemically and Topographically Patterned Substrates. Advanced Materials, 2007.
Park, Miri; Harrison, Christopher; Chaikin, Paul; Register, Richard; Adamson, Douglas. Block Copolymer Lithography: Periodic Arrays of˜10Λ11 Holes in 1 Square Centimeter. Science. vol. 276. May 30, 1997.
Stoykovich, Mark; Kang, Huiman; Daoulas, Kostas; Liu, Guoliang; Liu, Chi-Chun; Pablo, Juan; Muller, Marcus; Nealey, Paul. Directed Self-Assembly of Block Copolymers for Nanolithography: Fabrication of Isolated Features and Essential Integrated Circuit Geometries.
Bandic et al., “Patterned magnetic media: impact of nanoscale patterning on hard disk drives”, Solid State Technology S7+ Suppl. S, Sep. 2006.
Terris et al., “Topical Review: Nanofabricated and self-assembled magnetic structures as data storage media”, J. Phys. D: Appl. Phys. 38 (2005) R199-R222.
Moritz et al., “Patterned Media Made From Pre-Etched Wafers: A Promising Route Toward Ultrahigh-Density Magnetic Recording”, IEEE Transactions on Magnetics, vol. 38, No. 4, Jul. 2002, pp. 1731 1736.
Kim et al.,“Rapid Directed Self-Assembly of Lamellar Microdomains from a Block Copolymer Containing Hybrid”, Proc. of SPIE vol. 6921, 692129, (2008).
Kim et al., “Device-Oriented Directed Self-Assembly of Lamella Microdomains from a Block Copolymer Containing Hybrid”, Proc. of SPIE vol. 6921, 69212B, (2008).
Kim et al., “Self-Aligned, Self-Assembled Organosilicate Line Patterns of ˜20nm Half-Pitch from Block Copolymer Mediated Self-Assembly”, Proc. of SPIE vol. 6519, 65191H, (2007).
Black, C. T. et al., “Polymer self assembly in semiconductor microelectronics”, IBM Journal of Research and Development, vol. 51, No. 5, p. 605 (2007).
Thurn-Albrecht, T. et al., “Nanoscopic Templates from Oriented Block Copolymer Films”, Advanced Materials 2000, 12, 787.
Dobisz, E. A. et al., “Thin Silicon-Nitride Films for Reduction of Linewidth and Proximity Effects in Electron-Beam Lithography”, Journal of Vacuum Science & Technology B, vol. 10, Issue 6, Nov.-Dec. 1992, pp. 3067-3071.
Dobisz Elizabeth Ann
Ruiz Ricardo
Berthold Thomas R.
Hitachi Global Storage Technologies - Netherlands B.V.
Lin Patti
Vinh Lan
LandOfFree
Method using block copolymers for making a master mold with... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method using block copolymers for making a master mold with..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method using block copolymers for making a master mold with... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2739667