Method to resolve line end distortion for alternating phase...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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C716S030000, C716S030000, C716S030000

Reexamination Certificate

active

07445874

ABSTRACT:
A embodiment method for forming a layout for a phase shift mask. A embodiment comprises providing a layout comprising a first feature, a first shifter region and a second shifter region. The first feature preferably has a L-shape portion with an elbow region. The first shifter region is on the outside of the L-shaped portion and the second shifter region is on the inside of the L-shaped portion. The elbow region has an outside corner away from the second shifter region. We identify a phase conflict region caused by the L-shaped portion of the first feature, the first shifter region and the second shifter region. We resolve the phase conflict by modifying the elbow region by moving the outside corner of the elbow region away from the first shifter region and the phase conflict region. The modification of the elbow region further comprises forming a jog region in the line end section of the first feature.

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patent: 6470489 (2002-10-01), Chang et al.
patent: 6553560 (2003-04-01), Ma
patent: 6623895 (2003-09-01), Chen
patent: 6664009 (2003-12-01), Lin
patent: 6706452 (2004-03-01), Hayano et al.
patent: 6711732 (2004-03-01), Dai

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