Method to prevent backside growth on substrates in a vapor depos

Details Method to prevent backside growth on substrates in a vapor depos Method to prevent backside growth on substrates in a vapor depos

1989-09-07

1990-10-16

Morgenstern, Norman

Coating processes

Coating by vapor, gas, or smoke

427249, 118721, 118728, 118504, 118505, C23C 1600, C23C 1604

Patent

active

049633937

ABSTRACT:
Backside growth on substrates in a vapor deposition system has been a problem resulting in cracking of the material deposited on the substrate, making replication in a vapor deposition system difficult to achieve, and requiring post deposition machining to separate the substrate-deposit from the deposition fixture. A solution to the problem is the following: the substrate is mounted on a plurality of graphite pillars, with the pillars being bonded to the substrate as near the periphery thereof as possible. A hollow body open on one side but closed on the other, and fabricated from GRAFOIL with graphite cement used as a bonding agent, is mounted on the pillars with the open end facing the substrate. The open end of the body is pressed against the substrate and sealed with a bonding agent. This completely covers the backside of the substrate and thus prevents any vapor deposition thereon.

REFERENCES:
patent: 4448797 (1984-05-01), Burnham
patent: 4705659 (1987-11-01), Bernstein et al.

Affiliated with

Also associated with

Rating

Method to prevent backside growth on substrates in a vapor depos does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method to prevent backside growth on substrates in a vapor depos, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method to prevent backside growth on substrates in a vapor depos will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-848958