Method to measure oxide thickness by FTIR to improve an...

Details Method to measure oxide thickness by FTIR to improve an... Method to measure oxide thickness by FTIR to improve an...

2005-05-17

2005-05-17

Pretlow, Demetrius R. (Department: 2863)

Data processing: measuring, calibrating, or testing

Measurement system

Dimensional determination

Reexamination Certificate

active

06895360

ABSTRACT:
A method for determining a material layer thickness transmissive to infrared (IR) energy in a semiconductor wafer manufacturing process including providing at least one semiconductor wafer comprising an IR transmissive layer; passing IR energy through the IR transmissive layer to produce at least one Fourier transform infrared (FTIR) spectrum; and, determining an amount of the IR transmissive layer present according to an amount of IR energy absorbed by a predetermined contributing characteristic vibrational mode portion of the FTIR spectrum.

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