Method to manufacture Indium Nitride quantum dots

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With decomposition of a precursor

Reexamination Certificate

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C438S962000

Reexamination Certificate

active

06966948

ABSTRACT:
The invention concerns a method for manufacturing sizeable quantum dots of Indium Nitride in which a layer of Indium Nitride is grown onto a layer of crystalline buffer. The crystalline buffer is chosen with a lattice structure similar to the lattice structure of Indium Nitride and with the lattice mismatch between Indium Nitride and the crystalline buffer being greater than 5%. During the growth of Indium Nitride, surface strains are produced by the crystalline buffer, allowing the Indium Nitride to self-organize onto the crystalline buffer so as to form a plurality of sizeable quantum dots.

REFERENCES:
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patent: WO 00/07221 (2000-02-01), None
Yuan et al; “Electrically Driven Single-Photon Source”; Science; Jan. 2002, pp. 102-105; XP002278163.
Briot et al; “Indium nitride quantum dots grown by metalorganic vapor phase epitaxy”; Applied Physics Letters, American Institute of Physics; vol. 83, No. 14; pp 2919-2921, XP001189952; Oct., 2003.
Schallenberg et al; “Controlled self-assembly of semiconductor quantum dots using shadow masks”; Applied Physics Letters, American Institute of Physics; vol. 82, No. 24; Jun., 2003; pp. 4349-4351; XP001175289.
Williams et al; “Controlling the self-assembly of InAs/InP quantum dots”; Journal of Crystal Growth; vol. 223, No. 3, Mar. 2001; pp. 321-331; XP004229645.

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