Method to make small isolated features with...

Details Method to make small isolated features with... Method to make small isolated features with...

2005-08-16

2005-08-16

Chaudhari, Chandra (Department: 2891)

Semiconductor device manufacturing: process

Having magnetic or ferroelectric component

C438S381000, C438S577000

Reexamination Certificate

active

06929958

ABSTRACT:
A method for forming small, isolated device structures by photolithography, utilizing overlapping bi-layer suspension-bridge shaped photomasks. The use of a suspended mask to define a device shape beneath it eliminates the problems associated with uneven undercutting of the usual bi-layer mask which is a stencil portion formed on a lower pedestal. In particular, the use of a suspended mask eliminates undesirable dielectric buildup around the device caused by an insufficiently undercut pedestal or of premature mask lift-off caused by an overly undercut pedestal.

REFERENCES:
patent: 6493926 (2002-12-01), Han et al.
patent: 6522573 (2003-02-01), Saito et al.
patent: 6562199 (2003-05-01), Shimazawa et al.
patent: 6572917 (2003-06-01), Narisawa et al.
patent: 6610602 (2003-08-01), Gambino et al.
patent: 6780738 (2004-08-01), Kamijima

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