Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation
Patent
1998-03-13
2000-08-15
Fourson, George
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Responsive to electromagnetic radiation
438 73, 438466, 438705, 136261, H01L 3118
Patent
active
061035467
ABSTRACT:
The rapid thermal oxidation (RTO) and rapid thermal annealing(RTA) were used to improve the photo-current and photoresponsivity of porous silicon photodetector. In addition, we remove the surface oxide of the porous silicon under the metal grid using the same mask, and enhance the photo-current of porous silicon photodetector at zero bias voltage. This invention removes the limitation of application of the porous silicon photodetector.
REFERENCES:
patent: 5478757 (1995-12-01), Lee
patent: 5627081 (1997-05-01), Tsuo et al.
Fourson George
Garcia Joannie A.
National Science Council
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