Method to form high density phase change memory (PCM) top...

Semiconductor device manufacturing: process – Having selenium or tellurium elemental semiconductor component

Reexamination Certificate

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C438S095000, C257S003000, C257SE47001, C257SE47005, C257SE21068

Reexamination Certificate

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08030128

ABSTRACT:
Embodiments of the present invention provide a method that includes providing a substrate including an emitter layer comprising a plurality of emitters, each emitter defining an axis, forming a heater layer above the emitter layer, and forming a phase change memory (PCM) cell layer above the heater layer. The method also includes forming a top contact layer above the PCM cell layer. The top contact layer comprises a plurality of top contacts, where each top contact is located between two axes. Other embodiments are also described.

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patent: 7745809 (2010-06-01), Sutardja et al.
patent: 2002/0079483 (2002-06-01), Dennison
patent: 2003/0003709 (2003-01-01), Xu
patent: 2006/0091492 (2006-05-01), Lee et al.
patent: 2006/0105556 (2006-05-01), Matsui et al.
patent: 2007/0020797 (2007-01-01), Pellizzer et al.
patent: 2008/0185570 (2008-08-01), Wu et al.

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