Method to form a pattern of functional material on a...

Coating processes – Nonuniform coating – Mask or stencil utilized

Reexamination Certificate

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C427S272000

Reexamination Certificate

active

07875313

ABSTRACT:
The invention provides a method to form a pattern of functional material on a substrate for use in electronic devices and components. The method uses a stamp having a relief structure to transfer a mask material to a substrate and form a pattern of open area on the substrate. The functional material is applied to the substrate in at least the open area. Contact of an adhesive material to an exterior surface opposite the substrate and separation of the adhesive from the substrate forms the pattern of functional material on the substrate. The method is suitable for the fabrication of microcircuitry for electronic devices and components.

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