Method to form a current confining path of a CPP GMR device

Details Method to form a current confining path of a CPP GMR device Method to form a current confining path of a CPP GMR device

2006-02-13

2009-11-03

Kim, Paul D (Department: 3729)

Metal working

Method of mechanical manufacture

Electrical device making

C029S603150, C029S603160, C029S603180, C216S065000, C360S121000, C360S122000, C360S317000, C427S127000, C427S128000

Reexamination Certificate

active

07610674

ABSTRACT:
Concerns about inadequate electromigration robustness in CCP CPP GMR devices have been overcome by adding magnesium to the current confining structures that are presently in use. In one embodiment the alumina layer, in which the current carrying copper regions are embedded, is fully replaced by a magnesia layer. In other embodiments, alumina is still used but a layer of magnesium is included within the structure before it is subjected to ion assisted oxidation.

REFERENCES:
patent: 6560077 (2003-05-01), Fujiwara et al.
patent: 6998150 (2006-02-01), Li et al.
patent: 7256971 (2007-08-01), Horng et al.
patent: 2003/0053269 (2003-03-01), Nishiyama
patent: 2004/0190204 (2004-09-01), Yoshikawa et al.
patent: 2005/0002126 (2005-01-01), Fujiwara et al.
patent: 2005/0052787 (2005-03-01), Funayama et al.
patent: 2005/0094317 (2005-05-01), Funayama
patent: 2005/0122633 (2005-06-01), Nowak et al.
patent: 2005/0152076 (2005-07-01), Nagasaka et al.

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