Etching a substrate: processes – Nongaseous phase etching of substrate – Etching inorganic substrate
Reexamination Certificate
2006-03-28
2006-03-28
Ahmed, Shamim (Department: 1765)
Etching a substrate: processes
Nongaseous phase etching of substrate
Etching inorganic substrate
C216S096000, C252S079100, C252S079500, C430S005000
Reexamination Certificate
active
07018556
ABSTRACT:
A method for maintaining a micro-roughness finish after etching chrome from a surface of a calcium fluoride (CaF2) object. Etching the chrome a first amount in a first chrome etchant. Etching the chrome a second amount beyond the first predetermined amount in second chrome etchant, such that the CaF2 object maintains a low micro-roughness.
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patent: 5246801 (1993-09-01), Pierrat
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patent: 2004/0137336 (2004-07-01), Cummings
Albright Ronald P.
DeLuca Nicholas A.
Ahmed Shamim
ASML Holding N.V.
Sterne Kessler Goldstein & Fox P.L.L.C.
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