Method to electrochemically deposit compound semiconductors

Details Method to electrochemically deposit compound semiconductors Method to electrochemically deposit compound semiconductors

1991-05-06

1994-06-14

Niebling, John

Electrolysis: processes, compositions used therein, and methods

Electrolytic coating

Coating predominantly semiconductor substrate

205170, 205171, 205177, 205182, 205915, C25D 510

Patent

active

053207360

ABSTRACT:
A method to electrochemically deposit semiconductors and for the electrochemical formation of epitaxial thin-film, single-crystalline compound semiconductors comprising alternating electrodeposition of atomic layers of selected pairs of elements using underpotential deposition.

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