Method to detect surface metal contamination

Details Method to detect surface metal contamination Method to detect surface metal contamination

2005-06-28

2005-06-28

Pert, Evan (Department: 2826)

Semiconductor device manufacturing: process

Including control responsive to sensed condition

Optical characteristic sensed

C438S016000

Reexamination Certificate

active

06911347

ABSTRACT:
A method for detecting surface or near surface metal contamination in a semiconductor or silicon structure is described in which the structure or a part thereof is exposed to an excitation beam of predetermined wavelength and collecting luminescence from the structure in as the form of PL map having a substantially uniform PL intensity level provided by the semiconductor; and inspecting the map for one or more regions of enhanced PL intensity identifying characteristic surface or near surface metal contamination. In particular, the method is applied as an in-process quality control or as a quality control of processed structures such as interconnects.

REFERENCES:
patent: 5943552 (1999-08-01), Koveshnikov et al.
patent: 6159859 (2000-12-01), Robertson et al.
patent: 2002/0109110 (2002-08-01), Some et al.
patent: 06109718 (1994-04-01), None
patent: 7-297246 (1995-11-01), None
patent: 11330043 (1999-11-01), None
patent: 2003-45928 (2003-02-01), None
patent: 9811425 (1998-03-01), None
Jean-Pierre Joly, “Metallic contamination assessment of Silicon wafers”, Microelectronic Engineering, vol. 40, No. 3-4, Nov. 1, 1998, pp. 285-294.
V. Higgs et al., “Application Of Room Temperature Photoluminescence For The Characterization Of Impurities And Defects In Silicon”, Electrochemical Society Proceedings, vol. 99-16, ppg., Sep. 13, 1999, pp. 21-37.

Affiliated with

Also associated with

Rating

Method to detect surface metal contamination does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method to detect surface metal contamination, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method to detect surface metal contamination will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3498925