Coating processes – Measuring – testing – or indicating – Thickness or uniformity of thickness determined
Patent
1990-06-28
1991-06-18
Bueker, Richard
Coating processes
Measuring, testing, or indicating
Thickness or uniformity of thickness determined
437 8, 118708, 118712, 118715, 427162, 4272481, 427 2, C23C 1454
Patent
active
050248537
ABSTRACT:
Method to control the thickness of an antireflection coating.
According to the invention, the semi-conductive structure (14) is fed with a constant current (16) and the voltage (24) is measured at its terminals. This voltage passes through a maximum when the reflectivity of the antireflection coating passes through a minimum.
Application for the embodiment of semi-conductive lasers.
REFERENCES:
patent: 3846165 (1974-11-01), Ettenberg
Somani, Applied Optics, vol. 27, No. 8, Apr. 15, 1988, pp. 1391-1393.
Serenyi, Applied Optics, vol. 26, No. 5, Mar. 1, 1987, pp. 845-849.
Landreau Jean
Nakajima Hisao
Bueker Richard
Etat Francais represente par le Ministre
LandOfFree
Method to control the thickness of an antireflection coating and does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method to control the thickness of an antireflection coating and, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method to control the thickness of an antireflection coating and will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-144896