Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Manufacturing optimizations
Reexamination Certificate
2011-06-14
2011-06-14
Kik, Phallaka (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Design of semiconductor mask or reticle
Manufacturing optimizations
C716S055000, C716S112000, C700S098000, C700S120000, C700S121000, C700S110000, C703S002000, C703S014000
Reexamination Certificate
active
07962866
ABSTRACT:
Disclosed are an improved method, system, and computer program product for a method or system with concurrent models to more accurately determine and represent the three-dimensional design features of electronic designs. Some embodiments disclose a method or a system for determining the design feature characteristics based upon their respective three-dimensional profiles. Some other embodiments further determine whether the design objectives or constraints are met or may be relaxed based upon the design feature characteristics in order to complete the design. Other embodiments store the profile or geometric characteristics, or information derived therefrom, in a database associated with the design to reduce the need for potentially expensive computations. The method or system may modify the designs or the processes to reflect whether the design objectives or constraints are met or relaxed.
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Scheffer Louis K.
White David
Cadence Design Systems Inc.
Kik Phallaka
Vista IP Law Group LLP
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