Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Manufacturing optimizations
Reexamination Certificate
2007-12-28
2011-12-13
Chiang, Jack (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Design of semiconductor mask or reticle
Manufacturing optimizations
Reexamination Certificate
active
08078997
ABSTRACT:
Various embodiments of the present invention are generally directed to a method, system, and computer program product for implementing direct measurement model with simulation and calibration of manufacturing process model in the manufacturing of precision devices such as electronic integrated circuits. The method and the system determine the measured measurement result and the direct measurement information and compare the direct measurement information against the other to determine whether to adjust the process models and the empirical parameters thereof.
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Bowers Brandon
Cadence Design Systems Inc.
Chiang Jack
Vista IP Law Group LLP
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