Metal working – Method of mechanical manufacture – Electrical device making
Reexamination Certificate
2008-09-02
2008-09-02
Kim, Paul D (Department: 3729)
Metal working
Method of mechanical manufacture
Electrical device making
C029S603090, C029S603130, C204S192150, C360S324110, C360S324120, C427S127000, C427S128000
Reexamination Certificate
active
11121929
ABSTRACT:
A method of manufacturing a spin valve film, produces a large read out signal. After a completion of a film making process for forming a previous film of two films to be formed successively, but before an initiation of a film making process for forming a succeeding film of the two films, a step of decreasing an anisotropic magnetic field of the spin valve film is introduced by interrupting a film making process. This step may be performed by keeping a substrate within a sputtering vacuum chamber. The interruption can be shortened by exposing the substrate to a plasma, transferring the substrate in a separate vacuum chamber is lower or whose H2O or O2concentration is higher than that in the sputtering vacuum chamber, conducting a surface treatment with a gas containing H2O or O2, or flowing a process gas.
REFERENCES:
patent: 5784225 (1998-07-01), Saito et al.
patent: 6051304 (2000-04-01), Takahashi
patent: 6210818 (2001-04-01), Saito
patent: 6295186 (2001-09-01), Hasegawa et al.
patent: 6387548 (2002-05-01), Hasegawa et al.
patent: 6482329 (2002-11-01), Takahashi et al.
patent: 6493196 (2002-12-01), Noma et al.
patent: 6700756 (2004-03-01), Hasegawa
patent: A 11-284248 (1999-10-01), None
patent: 2000150235 (2000-05-01), None
patent: WO 97/05664 (1997-02-01), None
patent: WO 98/44521 (1998-08-01), None
patent: WO 00/65577 (2000-11-01), None
patent: WO 01/56090 (2001-08-01), None
Yamada et al., “AMR Effect in Spin-Valve Structure”, IEEE transactions on Magnetics, vol. 32, Sep. 1996, pp. 3431-3433.
Tsang et al., “Design, Fabrication & Testing of Spin-Valve Read Heads for High Density Recording”, IEEE Transactions on Magnetics, vol. 30, No. 6, Nov. 1994.
Amano Hajime
Sasaki Tetsuro
Sato Jun-ichi
Takezutsumi Hiroaki
Kim Paul D
Oliff & Berridg,e PLC
TDK Corporation
LandOfFree
Method on manufacturing spin valve film does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method on manufacturing spin valve film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method on manufacturing spin valve film will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3926054